Resin filling of UV-cured nanoimprints using pentafluoropropane to fabricate large patterns with a thin residual layer

Resin filling of UV-cured nanoimprints using pentafluoropropane to fabricate large patterns with a thin residual layer

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 136, 25 March 2015, Pages 81-84

Qing Wang, Hiroshi Hiroshima, Kenta Suzuki, Sung-Won Youn,