کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
6943743 1450369 2013 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Development of a nondeforming chucking technique for EUV lithography
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Development of a nondeforming chucking technique for EUV lithography
چکیده انگلیسی

- A nondeforming chucking technique for EUV lithography has been developed.
- Temperature distribution and shear and tension forces during freezing were calculated by FEM.
- Shear strength of 0.2 N per pin and tensile strength of 0.34 N per pin, and solidification deformation below ±0.15 μm were measured.
- The new freezing pin chuck has the pitch of 2 mm and are cooled with coolant of 5 °C.
- The new chuck can clamp the low expansion glass mask without deformation at temperatures below 50 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 112, December 2013, Pages 278-281
نویسندگان
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