کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6944375 | 1450383 | 2012 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of dynamic sub-pixelation on exposure intensity distribution under diffraction effects in spatial light modulation based lithography
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
⺠The irradiance is influenced by diffraction effects in SLM-based lithography. ⺠Dynamic sub-pixelation (DSP) is proposed to enhance image resolution. ⺠The diffraction effect is suppressed as the DSP degree increases. ⺠Specific lithography parameters and their relationships for DSP are defined. ⺠The potential of utilizing DSP for suppressing diffraction effects is demonstrated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 98, October 2012, Pages 125-129
Journal: Microelectronic Engineering - Volume 98, October 2012, Pages 125-129
نویسندگان
Manseung Seo, Haeryung Kim,