کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
6944375 1450383 2012 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of dynamic sub-pixelation on exposure intensity distribution under diffraction effects in spatial light modulation based lithography
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Influence of dynamic sub-pixelation on exposure intensity distribution under diffraction effects in spatial light modulation based lithography
چکیده انگلیسی
► The irradiance is influenced by diffraction effects in SLM-based lithography. ► Dynamic sub-pixelation (DSP) is proposed to enhance image resolution. ► The diffraction effect is suppressed as the DSP degree increases. ► Specific lithography parameters and their relationships for DSP are defined. ► The potential of utilizing DSP for suppressing diffraction effects is demonstrated.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 98, October 2012, Pages 125-129
نویسندگان
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