Fabrication of nanopore array based on the nanometer silver pore-mirror device

► We reported an efficient method to fabricate the nanopore arrays with large area based on single mode resonance (MSR) in the resist between the silver nanopore mask and nano-mirror. ► The resolution and exposure depth of the lithography patterns can be adjusted by changing the conditions of MSR. ► The results indicate that the silver pore-mirror device can well enhance the exposure depth and improves the resolution of photolithograph, which shows a vast application for fabricating nanostructures.