کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
6944509 1450383 2012 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Novel organic polymer for UV-enhanced substrate conformal imprint lithography
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Novel organic polymer for UV-enhanced substrate conformal imprint lithography
چکیده انگلیسی
► UV-curing organic polymers as resists for UV-SCIL were investigated. ► UV-SCIL processes for two fully organic polymers were developed. ► A reduction of UV-SCIL process time was achieved using an epoxy based resist. ► Structures were transferred using imprinted polymer layers as etching masks. ► A temperature assisted UV-SCIL process with epoxy based resists is introduced.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 98, October 2012, Pages 238-241
نویسندگان
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