Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents

Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Colloids and Surfaces A: Physicochemical and Engineering Aspects - Volume 555, 20 October 2018, Pages 72-79

Min-Su Kim, Muthukrishnan Purushothaman, Hyun-Tae Kim, Hee-Jin Song, Young-Woong Kim, Jin-Ho Ahn, Hye-Keun Oh, Jin-Goo Park,