Determination of the thermal cycle during flash lamp annealing without a direct temperature measurement

Flash lamp annealing (FLA) is a modern annealing technique which, starting from microelectronics, has spread over new application areas like flexible electronics, photovoltaics or thin film deposition. Because of the short annealing time in the range of milliseconds and below, FLA allows the suppression of unwanted processes like diffusion, the annealing of temperature-sensible substrates, and the saving of process time and energy. In addition, it is predestined for roll-to-roll applications. However, the determination of the thermal cycle during FLA is challenging. The existing methods for a direct temperature measurement, mostly based on pyrometry, are elaborate and have to solve the problem to detect thermal radiation against the background of the intense flash light. An alternative way is simulation, but now an extended knowledge about the flash and the material system to be flashed is needed. In this work we describe a methodology to determine the thermal cycle during FLA without the need for a direct temperature measurement. This methodology is based on an optical-thermodynamic simulation and calibration experiments which can be implemented with reasonable effort under certain assumptions. The simulation considers not only the properties of the flash and the sample, but also the reflectivity of the chamber walls. Finally, the pros and cons of this methodology are shortly discussed.