کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7118068 1461372 2018 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Formation of black silicon using SiGe self-assembled islands as a mask for selective anisotropic etching of silicon
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Formation of black silicon using SiGe self-assembled islands as a mask for selective anisotropic etching of silicon
چکیده انگلیسی
Simple technique of formation of “black silicon” using wet chemical etching of crystalline Si wafers with SiGe self-assembled islands is proposed. The main idea consists of the utilization of SiGe islands as a mask for wet anisotropic etching of Si in alkali-based solution at the first etching stage and further removal of SiGe residuals by etching in a HF:H2O2:CH3COOH mixture at the second etching stage. Initial samples were the crystalline Si wafers with SiGe islands formed on them by deposition of 2.5-14 nm of Ge at 800 °C. After the two above-mentioned etching steps a submicron relief on a Si surface was formed. Investigation of optical properties of fabricated structures revealed significant decrease of reflection (AM 1.5 G weighted reflection ~2-3%) and increase of absorption in the wavelength range of 500-1200 nm. Due to the very small amount of Si removal (<0.5 µm), utilization of standard chemicals for Si-based solar cell technology and potential suitability for usage in large-scale manufacturing the proposed technique is promising for increasing of efficiency of thin wafers crystalline Si solar cell.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 75, 1 March 2018, Pages 143-148
نویسندگان
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