کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7118481 | 1461391 | 2016 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Pattern transfer of microstructures between deeply etched surface for MEMS applications
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Photolithography plays a vital role in micromachining process however; coating a thin and uniform resist layer on a non-planar surface is a challenging task for micro-electro-mechanical system (MEMS). Conventional spin coating of photoresist (PR) over an un-even surface would deliver streaks all over the wafer surface. Spray coating of PR is a promising technique when compared to other candidates. This paper presents an efficient pattern transfer of microstructures between the bulk micromachined cavities over silicon and glass wafers using an uncommon photoresist mixture being spray coated. The method is simple and highly cost effective. Finally we implemented this technique for a MEMS application to prove the feasibility of spray coating for microstructure fabrication.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 56, December 2016, Pages 373-380
Journal: Materials Science in Semiconductor Processing - Volume 56, December 2016, Pages 373-380
نویسندگان
Robin Joyce, Supriya Yadav, Akash Kumar Sharma, Deepak Kumar Panwar, Ravi Raj Bhatia, Soney Varghese, Jamil Akhtar,