کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7119045 | 1461407 | 2015 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The source of negative capacitance and anomalous peak in the forward bias capacitance-voltage in Cr/p-si Schottky barrier diodes (SBDs)
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The frequency and voltage dependence of capacitance-voltage (C-V) and conductance-voltage (G/ÏâV) characteristics of the Cr/p-Si metal semiconductor (MS) Schottky barrier diodes (SBDs) were investigated in the frequency and applied bias voltage ranges of 10Â kHz to 5Â MHz and (â4Â V)â(+4Â V), respectively, at room temperature. The effects of series resistance (Rs) and density distribution of interface states (Nss), both on C-V and G/ÏâV characteristics were examined in detail. It was found that capacitance and conductance, both, are strong functions of frequency and applied bias voltage. In addition, both a strong negative capacitance (NC) and an anomalous peak behavior were observed in the forward bias C-V plots for each frequency. Contrary to the behavior of capacitance, conductance increased with the increasing applied bias voltage and there happened a rapid increase in conductance in the accumulation region for each frequency. The extra-large NC in SBD is a result of the existence of Rs, Nss and interfacial layer (native or deposited). In addition, to explain the NC behavior in the forward bias region, we drew the C-I and G/ÏâI plots for various frequencies at the same bias voltage. The values of C decrease with increasing frequency at forward bias voltages and this decrease in the NC corresponds to an increase in conductance. The values of Nss were obtained using a Hill-Coleman method for each frequency and it exhibited a peak behavior at about 30Â kHz. The voltage dependent profile of Rs was also obtained using a Nicollian and Brews methods.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 39, November 2015, Pages 484-491
Journal: Materials Science in Semiconductor Processing - Volume 39, November 2015, Pages 484-491
نویسندگان
ÃiÄdem Bilkan, Ahmet GümüÅ, Åemsettin Altındal,