کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7119084 | 1461407 | 2015 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Carbon ions irradiation induced modifications in structural and electrical resistivity characteristics of ZrN thin films
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
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چکیده انگلیسی
Zirconium nitride (ZrN) thin films are irradiated with 800 keV energetic carbon (C) ions in a 5UDH-Pelletron accelerator and the ions irradiation induced effects are investigated. The films are irradiated at various C ions fluences, ranging from 1013 to 1015 ions/cm2. The scanning electron microscopy study of the films indicates the development of zirconium (Zr) nanoparticles at ions irradiated region. X-ray diffraction (XRD) patterns of C ions irradiated films also show the formation of (100) and (002) oriented nanocrystalline metallic Zr phases. The irradiated films spectra depict a shift in ZrN peaks towards higher 2θ values, exhibiting that C ions bombardment induces compressive stress in the irradiated films. The appearance of C related peaks in Fourier transform infrared (FTIR) spectra confirms the incorporation of C atoms into ZrN film. Compressive stress has been calculated from the IR peak shift which indicates that higher ion dose (â¥5Ã1014 ions/cm2) produce lower compressive stress relative to the lower ions fluences. Effect of ion dose on the film resistivity is also reported.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 39, November 2015, Pages 530-535
Journal: Materials Science in Semiconductor Processing - Volume 39, November 2015, Pages 530-535
نویسندگان
Shakil Khan, Ishaq Ahmed, Noaman Khalid, Mazhar Mehmood, Abdul Waheed, Maaza Malik,