کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7119755 | 1461429 | 2014 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of annealing on the structures and properties of Al and F co-doped ZnO nanostructures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
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چکیده انگلیسی
Al-F co-doped ZnO (AFZO) nanocrystals were successfully synthesized onto glass substrates by the sol-gel method and the structure and morphology of the films as a function of annealing temperature were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The results indicated that all the films were polycrystalline with a hexagonal wurtzite structure and exhibited a c-axis preferred orientation. The XPS study confirmed that co-doping ions are successfully incorporated into the ZnO nanostructure. AFZO thin films annealed at 500 °C exhibited the lowest resistivity due to the higher carrier concentration and mobility. The knowledge acquired in this work is important for the AFZO thin films with applications in optoelectronic devices.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 17, January 2014, Pages 162-167
Journal: Materials Science in Semiconductor Processing - Volume 17, January 2014, Pages 162-167
نویسندگان
Zhanchang Pan, Yonghao Xiao, Xinlong Tian, Shoukun Wu, Chun Chen, Jianfeng Deng, Chumin Xiao, Guanghui Hu, Zhigang Wei,