کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
726975 1461430 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Investigation of BiFe0.95Mn0.03Zn0.02O3/Bi3.15Nd0.85Ti2.9Zr0.1O12 heterostructure thin film fabricated by a chemical solution deposition technique
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Investigation of BiFe0.95Mn0.03Zn0.02O3/Bi3.15Nd0.85Ti2.9Zr0.1O12 heterostructure thin film fabricated by a chemical solution deposition technique
چکیده انگلیسی

A BiFe0.95Mn0.03Zn0.02O3/Bi3.15Nd0.85Ti2.9Zr0.1O12 (BFMZ/BNTZ) heterostructure thin film was prepared on Pt/Ti/SiO2/Si (1 0 0) substrate by a chemical solution deposition (CSD) technique. The structural, magnetic, dielectric properties, and leakage current of the BFMZ/BNTZ heterostructure thin film were thoroughly investigated. The analysis of X-ray diffraction (XRD) demonstrated that the BFMZ/BNTZ heterostructure thin film was of a polycrystalline perovskite structure. A slim magnetic hysteresis (M-H) loop for the BFMZ/BNTZ heterostructure thin film was observed. The dielectric constant together with dielectric loss measurement indicates that the BFMZ/BNTZ thin film exhibit a lossy dielectric with an εr of 60.5 and a tan δ of 0.392 at a frequency of 1 MHz. In addition, the leakage current density of BFMZ/BNTZ thin film measured at an applied electric field of 50 kV/cm is about 5.65×10−4 A/cm2.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 14, Issues 3–4, September–December 2011, Pages 253–256
نویسندگان
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