کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
728374 892836 2013 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effects of Cu/In ratio and annealing temperature on physical properties of dip-coated CuInS2 thin films
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Effects of Cu/In ratio and annealing temperature on physical properties of dip-coated CuInS2 thin films
چکیده انگلیسی

CuInS2 thin films were prepared by sol–gel dip-coating method on glass substrates using 0.75, 1 and 1.25 ratios of Cu/In in the solution. The prepared films were annealed at 380 °C, 420 °C and 460 °C for 30 min under argon environment. The structural, optical, morphological and composition properties of those were investigated by X-ray diffraction (XRD), UV–vis transmittance spectroscopy and scanning electron microscopy with an energy dispersive X-ray spectrometer. The XRD results showed that the films exhibit polycrystalline tetragonal CuInS2 phase with (112) orientation. According to the EDX results the Cu/In ratios of the films were respectively 0.65, 0.92 and 1.35 for the Cu/In ratios of 0.75, 1 and 1.25 in the solutions. The optical band gap was found to be between 1.30 eV and 1.43 eV, depending on Cu/In ratio.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 16, Issue 1, February 2013, Pages 138–142
نویسندگان
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