Nano-structure formed by nanosecond laser annealing on amorphous Si surface

The formation of nano-structure on an amorphised Si surface is studied upon annealing by a nanosecond laser pulse of an excimer laser. The resulting structures are studied by means of the reflection high-energy electron diffraction technique and atomic force microscopy. Smoothing out of the post-implanted islands and then the formation of polycrystalline Si grains are observed in surfaces annealed with the energy density up to the threshold value.