کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
729222 | 1461416 | 2015 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Deposition of phase pure nickel sulfide thin films from bis(O-alkylxanthato)–nickel(II) complexes by the aerosol assisted chemical vapour deposition (AACVD) method
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Deposition of phase pure nickel sulfide thin films from bis(O-alkylxanthato)–nickel(II) complexes by the aerosol assisted chemical vapour deposition (AACVD) method Deposition of phase pure nickel sulfide thin films from bis(O-alkylxanthato)–nickel(II) complexes by the aerosol assisted chemical vapour deposition (AACVD) method](/preview/png/729222.png)
چکیده انگلیسی
Bis(O-alkylxanthato)nickel(II) complexes (alkyl=hexyl and octyl) have been synthesised and their X-ray single crystal structures determined. Nickel sulfide thin films were deposited from both complexes at different deposition temperatures by the aerosol assisted chemical vapour deposition (AACVD) method. Phase pure rhombohedral NiS and mixture of rhombohedral NiS (millerites) and Ni17S18 were deposited onto the glass and silicon substrates at temperatures between 250 and 400 °C. SEM images show that the films are based on irregular grains, nanodendrites and feather like morphologies.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 30, February 2015, Pages 368–375
Journal: Materials Science in Semiconductor Processing - Volume 30, February 2015, Pages 368–375
نویسندگان
Masood Akhtar, Neerish Revaprasadu, Mohammad Azad Malik, James Raftery,