Effect of hydrogen on interface of metal–semiconductor Schottky diode

The effect of hydrogen on p-type Si/Mn and Si/Co Schottky diode has been investigated in present studies. The variations of I–V characteristics suggested that the rectifying act of these diodes change with variation of hydrogen pressure, which is due to the diffusion of hydrogen through the Mn and Co metal films up to Si surface or a creation of surface states at the interface. It is also observed that the effect of hydrogen found to be reverse in order for forward as well as reverse direction of current in Mn and Co deposited films on Si substrate, corresponding to anionic and protonic model of hydrogen interaction with metals. One can say that hydrogen plays an amphoteric role to neutralize either donors or acceptors level in semiconductors and metals. The Raman spectra of Si/Mn and Si/Co are taken and stoke lines link with the presence of hydrogen is observed. In this paper, we are presenting the role of hydrogen pressure on I–V characteristics at the interface of metal–semiconductor structure.