کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
729827 1461433 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Stochastic continuum model of submonolayer epitaxial growth
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Stochastic continuum model of submonolayer epitaxial growth
چکیده انگلیسی

The kinetic roughening of growing epitaxial layers is investigated with a phenomenological stochastic differential equation. This nonlinear equation takes account of deposition and surface diffusion, to which we have added a periodic pinning potential that has the vertical crystal lattice period to stabilize the planar crystal surface. If this potential is the dominant term in the equation, the surface roughness shows oscillations that indicate the progressive filing of successive monolayers. The properties of the submonolayer regime obtained from our equation are qualitatively similar to those obtained from kinetic Monte Carlo simulations and seen in experiments.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 12, Issues 1–2, February–April 2009, Pages 2–5
نویسندگان
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