کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
748004 | 1462248 | 2013 | 6 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Tunnel FET with non-uniform gate capacitance for improved device and circuit level performance Tunnel FET with non-uniform gate capacitance for improved device and circuit level performance](/preview/png/748004.png)
We report the significant improvement obtained by a non-uniform gate capacitance made by appropriate combination of high-k and low-k regions over the tunneling and the channel regions of a heterostucture TFET (called HKLKTFET). In addition to significantly enhanced ION and subthreshold swing, we find that this structure offers great improvements for the dynamic switching energy (66% saving) and propagation delay (∼3× fast operation) compared to a heterostructure TFET (HeTFET) due to the reduction of the Miller effect. We compare and benchmark the proposed device against a 65 nm low stand-by power (LSTP) CMOS technology, and we show that at a supply voltage of VDD = 0.4 V, TFETs can have smaller propagation delays compared to CMOS operating in the subthreshold region. Higher cut-off frequency (∼3×) and bandwidth for analog applications is observed in circuit-level simulations.
► A non-uniform gate oxide stack proposed for TFET structures.
► TCAD simulations reveal drastic reduction in device capacitance for non-uniform gate stacks due to utilization of low-k oxide.
► Investigation of circuit-level figures of merit via SPICE simulation.
► Circuit level performance improvement for non-uniform structure due to the reduction of the capacitance.
Journal: Solid-State Electronics - Volume 84, June 2013, Pages 205–210