کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
748359 1462252 2013 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
HfO2 nanocrystal memory on SiGe channel
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
HfO2 nanocrystal memory on SiGe channel
چکیده انگلیسی

This study proposes a novel HfO2 nanocrystal memory on epi-SiGe (Ge: 15%) channel. Because SiGe has a smaller bandgap than that of silicon, it increases electron/hole injection and the enhances program/erase speeds. This study compares the characteristics of HfO2 nanocrystal memories with different oxynitride tunnel oxide thicknesses on Si and epi-SiGe substrate. Results show that the proposed nonvolatile memory possesses superior characteristics in terms of considerably large memory window for two-bits operation, high speed program/erase for low power applications, long retention time, excellent endurance, and strong immunity to disturbance.


► This study proposes a novel HfO2 nanocrystal memory on epi-SiGe (Ge: 15%) channel.
► Program/erase speed were improved by epi-SiGe (Ge: 15%) channel.
► The characteristics of different oxynitride tunnel oxide thicknesses were been compared.
► Superior memory characteristics can be achieved for this memory structure.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid-State Electronics - Volume 80, February 2013, Pages 5–9
نویسندگان
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