Electrical characteristics of 20-nm junctionless Si nanowire transistors

We have fabricated n-channel junctionless nanowire transistors with gate lengths in the range of 20–250 nm, and have compared their electrical performances with conventional inversion-mode nanowire transistors. The junctionless tri-gate transistor with a gate length of 20 nm showed excellent electrical characteristics with a high Ion/Ioff ratio (>106), good subthreshold slope (∼79 mV/dec), and low drain-induced barrier lowering (∼10 mV/V). The simpler fabrication process without junction formation results in improved short-channel characteristics compared to the inversion-mode devices, and also makes the junctionless nanowire transistor a promising candidate for sub 22-nm technology nodes.