کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
753304 895509 2009 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Impact ionization rates for strained Si and SiGe
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Impact ionization rates for strained Si and SiGe
چکیده انگلیسی

With the constant-matrix-element approach we have calculated the impact ionization (II) rates for uniaxially/biaxially strained Si and biaxially strained SiGe. Energy and momentum are exactly conserved during the calculation of the six-dimensional integral in k-space over four conduction and three valence bands. The wave-vector space is discretized with a very fine grid with a spacing of up to 140(2π/a), where a is the lattice constant. II coefficient and quantum yield for relaxed Si, strained Si and strained SiGe are calculated through full-band Monte Carlo simulations. Good agreement between simulation and experimental data for relaxed Si is obtained.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid-State Electronics - Volume 53, Issue 12, December 2009, Pages 1318–1324
نویسندگان
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