کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
753628 | 895556 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evaluation of MOS structures processed on 4H-SiC layers grown by PVT epitaxy
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Evaluation of MOS structures processed on 4H-SiC layers grown by PVT epitaxy Evaluation of MOS structures processed on 4H-SiC layers grown by PVT epitaxy](/preview/png/753628.png)
چکیده انگلیسی
MOS capacitors have been fabricated on 4H-SiC epilayers grown by physical vapor transport (PVT) epitaxy. The properties were compared with those on similar structures based on chemical vapor deposition (CVD) layers. Capacitance-voltage (C-V) and conductance measurements (G-V) were performed in the frequency range of 1Â kHz to 1Â MHz and also at temperatures up to 475Â K. Detailed investigations of the PVT structures indicate a stable behaviour of the interface traps from room temperature up to 475Â K. The amount of positive oxide charge QO is 6.83Â ÃÂ 109Â cmâ2 at room temperature and decreases with temperature increase. This suggests that the processed devices are temperature stable. The density of interface states Dit obtained by Nicollian-Brews conductance method is lower in the structure based on the PVT grown sample.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid-State Electronics - Volume 49, Issue 12, December 2005, Pages 1917-1920
Journal: Solid-State Electronics - Volume 49, Issue 12, December 2005, Pages 1917-1920
نویسندگان
R.R. Ciechonski, M. Syväjärvi, Q. Wahab, R. Yakimova,