Development of etching processes for the micropatterning of silicalite films

Silicalite (SIL-1) polycrystalline films have been synthesized on Si wafers and then micropatterned using both dry (ion milling, reactive ion etching) and wet etching processes after deploying a resin mask on the film top surfaces. The advantages and characteristics of the different etching processes are discussed and related to the orientation of the zeolite crystals in the films. Finally, the etching processes developed can also be used to release freestanding zeolite structures. This is demonstrated for the fabrication of bulk zeolite microcantilevers with a high aspect ratio.