کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7738662 | 1497985 | 2014 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Impedance spectroscopy of the oxide films formed during high temperature oxidation of a cobalt-plated ferritic alloy
ترجمه فارسی عنوان
طیف سنج امپدانس از فیلم های اکسید تشکیل شده در طول اکسیداسیون درجه حرارت بالا از یک آلیاژ فلزی کبالت
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کلمات کلیدی
سلول سوختی اکسید جامد، اتصال اسپینل، طیف سنج امپدانس، پوشش کبالت، مقیاس اکسید،
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
الکتروشیمی
چکیده انگلیسی
Impedance spectroscopy was used to evaluate the oxide films formed on cobalt-coated Crofer 22 APU ferritic stainless steel after thermal oxidation at 800 °C in air for different times (i.e. 2, 50, 100 and 500 h). Impedance spectra of the oxide films exhibited two or three semicircles depending on the oxidation time, which correspond to the presence of two or three individual oxide layers. Coupled with scanning electron microscopy/energy-dispersive spectroscopy (SEM/EDS) and X-ray diffraction (XRD), the individual oxide layer corresponding to each semicircle was determined unambiguously. Impedance spectrum analysis of the oxide films formed on the sample after thermal exposure at 800 °C in air for 2 h led to the identification of the low-frequency and high-frequency semicircles as being from Cr2O3 and Co3O4, respectively. SEM/EDS and XRD analysis of the 500-h sample clearly revealed the presence of three oxide layers, analyzed to be Co3âxCrxO4, CoCr2O4, and Cr2O3. Although the SEM images of the 50-h and 100-h samples did not clearly show the CoCr2O4 layer, impedance plots implied their presence. The oxide scales were assigned to their respective semicircles and the electrical properties of Co3âxCrxO4, CoCr2O4 and Cr2O3 were determined from the impedance data.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Power Sources - Volume 247, 1 February 2014, Pages 314-321
Journal: Journal of Power Sources - Volume 247, 1 February 2014, Pages 314-321
نویسندگان
S. Velraj, J.H. Zhu, A.S. Painter, S.W. Du, Y.T. Li,