Organosilane-assisted selective etching strategy for fabrication of hollow/rattle-type mesoporous organosilica nanospheres

HMSNs and RMSNs with organic functional groups and porous shell were fabricated based on a facile oganosilica-assisted selective etching strategy. VTES and CTES were adopted as sacrificial template and pore-making agent, respectively. Both of them can were removed after alkali treatment, and hollow and mesoporous structure was further achieved synchronously.187