کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7808339 | 1501660 | 2018 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The electrical and dielectric properties of the Au/Ti/HfO2/n-GaAs structures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی آلی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
In this work, temperature dependent electrical and dielectric properties of the Au/Ti/HfO2/n-GaAs structures were investigated using capacitance-voltage (C-V) and conductance-voltage (G-V) measurements in the temperature range of 60-320â¯K by steps of 20â¯K at 1â¯MHz. The dielectric constant (εâ²), dielectric loss (εâ³), dielectric loss tangent (tanδ) and ac electrical conductivities (Ïac) have been calculated as a function of temperature. These values of the εâ², εâ³, tanδ and Ïac have been found to be 2.272, 5.981, 2.631 and 3.32â¯Ãâ¯10â6 (Ωâ1cmâ1) at 80â¯K, respectively, 1.779, 2.315, 1.301 and 1.28â¯Ãâ¯10â6 (Ωâ1cmâ1), respectively at 320â¯K. These decrease of the dielectric parameters (εâ², εâ³, tanδ and Ïac) have been observed at high temperatures. The experimental results show that electrical and dielectric properties are strongly temperature and bias voltage dependent.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Molecular Structure - Volume 1157, 5 April 2018, Pages 513-518
Journal: Journal of Molecular Structure - Volume 1157, 5 April 2018, Pages 513-518
نویسندگان
Abdulkerim Karabulut, Abdulmecit Türüt, Åükrü KarataÅ,