کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
78108 | 49316 | 2014 | 5 صفحه PDF | دانلود رایگان |
• The fabrication method is simple, controllable, and low-cost.
• Well-separated and vertically aligned SiNW arrays were fabricated.
• The reflectance of array is less than 1% over a wide wavelength range.
• Conformal coating of a-Si on SiNWs was realized by PECVD for effective passivation.
Large-area, well-separated, and vertically aligned silicon nanowire (SiNW) arrays with excellent antireflection properties were fabricated through a combination of anodic aluminum oxide template and metal-assisted chemical etching, followed by supercritical drying. Less than 1% reflectance was achieved over the wavelength range of 200–600 nm, and 23% reduction in average reflectance was observed over the 200–1000 nm range, compared with the conical-frustum structure array by natural drying. Furthermore, the well-separated SiNW arrays considerably facilitated the conformal coating of the plasma-enhanced chemical vapor deposited amorphous silicon layer on the SiNW surface, which could result in effective passivation of surface states. Therefore, such well-separated and vertically aligned SiNW arrays are highly promising for solar cell application.
Journal: Solar Energy Materials and Solar Cells - Volume 125, June 2014, Pages 248–252