Effects of ITO precursor thickness on transparent conductive Al doped ZnO film for solar cell applications

Al doped ZnO (AZO) film was continuously deposited on ITO precursor on glass substrate by d.c. magnetron sputtering. The thickness of ITO was varied from 30 to 120 nm in order to investigate the effect of ITO thickness on crystallinity of AZO film. X-ray diffraction measurement shows that AZO film grown on ITO has an enhanced (0 0 2) preferred orientation as the ITO thickness was increased. The crystalline structure improvement of AZO film with an increase of ITO precursor thickness is due to the near-epitaxial growth of AZO on ITO precursor. As the ITO thickness was increased, mobility of AZO film by the Hall measurement was significantly increased from 5.4 cm2/V s (no ITO) to 23.6 cm2/V s (ITO 120 nm), and resistivity was about 81.7% improved from 1.99×10−3 to 3.63×10−4 Ω cm. The AZO films with ITO revealed excellent average transmission of visible (90.0%) and NIR (89.6%) regions, whereas those of AZO film without ITO were 82.1% and 88.1%, respectively. The haze values of AZO film with ITO of 90 and 120 nm are similar or higher than those of AZO film without ITO. The surface textured AZO film with ITO precursor is promising for optoelectronic applications such as the front TCO of thin film solar cells.