کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
79144 49349 2011 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Microcrystalline germanium thin films prepared by reactive RF sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی کاتالیزور
پیش نمایش صفحه اول مقاله
Microcrystalline germanium thin films prepared by reactive RF sputtering
چکیده انگلیسی

We study microcrystalline germanium (μc-Ge) film as narrow gap semiconductor materials for infrared absorbers by reactive sputtering with inert gas/mixtures. H2 mixed with Ne, Ar and Xe was used as sputtering gases, in order to research effects of the ion damage. A higher deposition rate is obtained by using inert gases with a larger mass. But the crystallinity becomes lower by the damage due to larger mass ions. In the Ar/H2 mixtures, the structure changes from crystalline to amorphous with increase in the Ar/H2 flow rate ratio. The damage of Xe ion is too large to crystallize the films, but the influence of Ne on the crystallinity is not significant. The photo-sensitivity is obtained in the mixed structures between crystalline and amorphous given by proper ion damages. The amorphous parts probably contribute suppression of the grain-boundary defects. The observation of photo-sensitivity indicates the possibility of μc-Ge as a narrow gap material for PV cells.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 95, Issue 1, January 2011, Pages 175–178
نویسندگان
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