کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
79495 49358 2012 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Use of inductively coupled plasma measurements to characterise light induced plating for silicon solar cells
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی کاتالیزور
پیش نمایش صفحه اول مقاله
Use of inductively coupled plasma measurements to characterise light induced plating for silicon solar cells
چکیده انگلیسی

Light-induced plating (LIP) can be used to form self-aligned metal contacts to selective-emitter silicon solar cells. Although LIP of metal contacts is attractively simple, it is difficult to directly measure parameters, such as the average plating current density, which are required if the plating chemistry is to be optimised. In this paper we describe the use of inductively-coupled plasma (ICP) spectrometry techniques to characterise LIP of laser-doped selective-emitter silicon solar cells. The average plating current density and the effect of different anode and cathode configurations on the aluminium dissolution from the rear surfaces of the solar cells were evaluated. The quality of LIP nickel layers was also characterised using ICP measurements for various critical parameters in the cell design, such as the conductivity of the laser-doped grooves and the lateral resistance of the emitter.


► We present an accurate measuring method to monitor light-induced plating(LIP) process.
► Average cell operating current density and cathode current density were calculated.
► It helps understand LIP process on solar cell using simple laboratory arrangements.
► It helps adjust LIP processing parameters to fabricate high efficiency solar cells.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 96, January 2012, Pages 257–265
نویسندگان
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