کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7993518 1516152 2018 25 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Molecular beam epitaxy growth and optical properties of high bismuth content GaSb1-xBix thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
Molecular beam epitaxy growth and optical properties of high bismuth content GaSb1-xBix thin films
چکیده انگلیسی
Epitaxial growth of GaSb1-xBix thin films on GaSb (100) substrates were studied by varying V/III ratio, growth temperatures and Bi flux using molecular beam epitaxy. It is demonstrated that reducing the V/III ratio facilitates Bi incorporation into GaSb effectively. The highest average Bi content up to 11% with locally up to 13% is achieved, confirmed by Rutherford backscattering spectroscopy and transmission electron microscopy (TEM). X-ray diffraction and TEM show perfect crystal quality for the GaSb1-xBix film with x = 5.6%. The composition dependence room temperature photoluminescence (PL) spectra of the GaSb1-xBix alloys with 0 < x ≤ 13% are reported for the first time. The band-gap energy decreases effectively with increasing the Bi content and in the range of 1 ≤ x ≤ 5.6%, the linear decreasing rate is 37 meV/Bi%. For the highest Bi content GaSb1-xBix, the PL peak energy reaches 0.41 eV (3.0 μm), indicating that GaSb1-xBix alloy has potentials in mid-infrared optoelectronic applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 742, 25 April 2018, Pages 780-789
نویسندگان
, , , , , , ,