کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7993518 | 1516152 | 2018 | 25 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Molecular beam epitaxy growth and optical properties of high bismuth content GaSb1-xBix thin films
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
Epitaxial growth of GaSb1-xBix thin films on GaSb (100) substrates were studied by varying V/III ratio, growth temperatures and Bi flux using molecular beam epitaxy. It is demonstrated that reducing the V/III ratio facilitates Bi incorporation into GaSb effectively. The highest average Bi content up to 11% with locally up to 13% is achieved, confirmed by Rutherford backscattering spectroscopy and transmission electron microscopy (TEM). X-ray diffraction and TEM show perfect crystal quality for the GaSb1-xBix film with xâ¯=â¯5.6%. The composition dependence room temperature photoluminescence (PL) spectra of the GaSb1-xBix alloys with 0â¯<â¯xâ¯â¤â¯13% are reported for the first time. The band-gap energy decreases effectively with increasing the Bi content and in the range of 1â¯â¤â¯xâ¯â¤â¯5.6%, the linear decreasing rate is 37 meV/Bi%. For the highest Bi content GaSb1-xBix, the PL peak energy reaches 0.41â¯eV (3.0â¯Î¼m), indicating that GaSb1-xBix alloy has potentials in mid-infrared optoelectronic applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 742, 25 April 2018, Pages 780-789
Journal: Journal of Alloys and Compounds - Volume 742, 25 April 2018, Pages 780-789
نویسندگان
Li Yue, Xiren Chen, Yanchao Zhang, Fan Zhang, Lijuan Wang, Jun Shao, Shumin Wang,