کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7994753 | 1516159 | 2018 | 25 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
High-K substrate effect on thermal properties of 2D InSe few layer
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Two-dimensional thin layers of indium selenide (InSe) have attracted much attention due to their potential applications in optoelectronics as highly responsive photo-detectors and field-effect transistors. In the present work, we explore thermal properties of InSe thin layers on a high-k substrate with a thin SiO2 passivation layer using temperature and power dependent Raman spectroscopy. The first order temperature coefficients for in-plane (E12g) and out-of-plane (A21g) modes of InSe few-layers on a Al2O3 substrate were found to be â0.00507 and â0.00310 cmâ1/K, respectively, which are much smaller than the corresponding values â0.00612 and â0.00528 cmâ1/K of similarly prepared sample on SiO2 substrate. The difference in temperature coefficients is attributed to compressive strain introduced by the Al2O3. Further, the average thermal conductivity of a 4 nm thin InSe layer on the Al2O3 substrate at room temperature was found to be â¼53.4 W/m-K, which is significantly larger than those of InSe layers prepared on SiO2 substrate (â¼28.7 W/m-K). The existed interface charges between the Al2O3 and InSe layers cause the observed improvement of thermal conductivity by electron-phonon interactions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 735, 25 February 2018, Pages 594-599
Journal: Journal of Alloys and Compounds - Volume 735, 25 February 2018, Pages 594-599
نویسندگان
V. Divakar Botcha, Mengdie Zhang, Kuilong Li, Hong Gu, Zhonghui Huang, Jianhui Cai, Youming Lu, Wenjie Yu, Xinke Liu,