MgyNi1−y(Hx) thin films deposited by magnetron co-sputtering

► Description of the co-sputtering deposition process of Mg and Ni with and without reactive H2. ► A mix of metallic and hydride particles forms for y > 0.33 under reactive sputtering. ► Electrical, optical and structural properties as well as the chemical stability of the resulting films are discussed. ► Low presence of metallic particles is observed for Mg∼2NiH∼4.