کد مقاله کد نشریه سال انتشار مقاله انگلیسی ترجمه فارسی نسخه تمام متن
8023722 1517539 2018 8 صفحه PDF سفارش دهید دانلود رایگان
عنوان انگلیسی مقاله ISI
Microstructure and growth mechanism of tungsten carbide coatings by atmospheric CVD
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موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Microstructure and growth mechanism of tungsten carbide coatings by atmospheric CVD
چکیده انگلیسی
A tungsten carbide coating was prepared by atmospheric chemical vapor deposition (CVD) with tungsten hexafluoride (WF6), hydrogen, and dimethyl ether (DME) as the reaction gases, under a dimethyl ether partial pressure (PDME) of 3.2-21.0 kPa and a temperature of 550-600 °C. The phase compositions of the coatings are W2C + W and W3C + W, and it is found that when PDME is low, the coating has a lamellar structure, but at a high PDME, the lamellar structure and fibrous tissue are simultaneously present in the scanning electron microscope (SEM) image. In the latter case, no delamination was found, which was visible at a low PDME. In addition, as the PDME increases, the deposition rate of the coating decreases, and ultimately, the coating cannot continue to grow. The growth model of the tungsten carbide coating based on the kinetics of the chemical vapor deposition of tungsten by the hydrogen reduction of tungsten hexafluoride was proposed, and the influences of PDME and temperature on the coatings were discussed and the orientation relationship between W and W2C in high resolution transmission electron microscopy (HRTEM) was analyzed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 344, 25 June 2018, Pages 85-92
نویسندگان
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