کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8037707 1518291 2018 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Monte Carlo simulation and theoretical calculation of SEM image intensity and its application in thickness measurement
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Monte Carlo simulation and theoretical calculation of SEM image intensity and its application in thickness measurement
چکیده انگلیسی
The intensity profiles of backscattered and secondary electrons from a pure Mg sample have shown a variation with sample thickness and acceleration voltage in the range of 5-30 kV, depending on the specimen holder used. The intensities of backscattered electron (BSE) and secondary electron (SE) signals increases with the sample thickness until saturation when using a scanning transmission electron microscopy (STEM) holder with a closed tube below the sample. However the SE signal increases to the maximum and then decreases with the sample thickness when using a transmission Kikuchi diffraction (TKD) holder with no shielding below the sample whereas the BSE signal again increases until saturation. The influence of the holder on the SE signals is caused by the fact that secondary electrons emitted from the bottom surface could be detected only when using the TKD holder but not the STEM holder. The experimental results obtained are consistent with the Monte Carlo simulation results. Application of the magnitude of the SE and BSE signals to measurement of sample thickness has been considered and the BSE image profile shows a reasonably good accuracy.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 187, April 2018, Pages 13-19
نویسندگان
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