Chemical vapor deposition of m-plane and c-plane InN nanowires on Si (100) substrate

In this paper, synthesis of indium nitride (InN) nanowires (NWs) by chemical vapor deposition (CVD) is studied. InN NWs were synthesized via a vapor-liquid-solid (VLS) growth mechanism using high purity indium foil and ammonia as the source materials, and nitrogen as carrier gas. The mixture of nonpolar m-plane oriented and polar c-plane oriented tapered InN NWs is observed grown on top of Si (100) substrate. Energy dispersive spectroscopy (EDS) showed that the tips of the NWs are primarily consisted of Au and the rest of the NWs are consisted of indium (In) and nitrogen (N). High resolution scanning electron microscopy (HRSEM) revealed that the InN NWs have both triangular and hexagonal cross sections. Transmission electron microscopy (TEM) diffraction pattern showed that the NWs are high quality single crystals having wurtzite crystal structure. High resolution transmission electron microscopy (HRTEM) showed the growth directions of the InN NWs with triangular cross section are along 〈10−10〉 nonpolar m-plane orientation and the InN NWs with hexagonal cross section are along 〈0001〉 polar c-plane orientation.