کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9605623 | 44171 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Photopolymerization of methyl methacrylate using dye-sensitized semiconductor based photocatalyst
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
بیو مهندسی (مهندسی زیستی)
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چکیده انگلیسی
Photopolymerization of methyl methacrylate (MMA) was carried out using semiconductor (CdS) as a photocatalyst under visible light exposure. The influences of additives like eosin (dye) and triethylamine on the photochemical properties of semiconductor (CdS) particle and photopolymerization of MMA were studied. A 2-3% conversion was achieved on using only CdS as photocatalyst. On using an electron donor (Et3N) along with CdS however a conversion of up to 14% was reached. The molecular weight in this case however was low. On carrying with eosin dye along with CdS, up to 22% yield of the polymer was obtained. The polymer so obtained was characterized by GPC. Polydispersity was found to be in the range of 6-6.5 for the polymer obtained by using dye as sensitized semiconductor catalyst and 4-4.5 for the polymer obtained using only dye as catalyst. The free radical polymerization of MMA has been established with EPR spectra.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Photochemistry and Photobiology A: Chemistry - Volume 172, Issue 2, 31 May 2005, Pages 121-125
Journal: Journal of Photochemistry and Photobiology A: Chemistry - Volume 172, Issue 2, 31 May 2005, Pages 121-125
نویسندگان
Raju Ojah, S.K. Dolui,