کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9670592 | 1450404 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Selective deposition of gold nanoparticles on SiO2/Si nanowire
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Selective deposition of gold nanoparticles on SiO2/Si nanowire Selective deposition of gold nanoparticles on SiO2/Si nanowire](/preview/png/9670592.png)
چکیده انگلیسی
We demonstrate selective deposition of citrate-passivated gold nanoparticles onto silicon dioxide patterns. Further, selective deposition of gold nanoparticles on the oxides, generated by scanning probe lithography (SPL), surface of silicon nanowire is achieved. Main methodology is to form H-terminated silicon surface and hydroxyl group on SiO2 sample surface, then link amino function group only on SiO2 surface by self-assembly mechanism. N-(2-Aminoethyl)-3-aminopropyl-trimethoxysilane (AEAPTMS) pretreated sample was immersed in the gold colloidal solution such that the NH2 group become protonated forming NH3+. The NH3+ groups provide a negative charge bindable environment for citrate-passivated gold nanoparticles. Impact on different AEAPTMS dilute solvents is also investigated for the performance of selective deposition of gold nanoparticles. It is found that H-terminated sample surface effectively eliminated nonspecific reaction during silanization such that microscale or nanoscale selective deposition of gold nanoparticles is obtainable. The proposed method can be applied in both nanoelectronics and nanobiosensors.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volumes 78â79, March 2005, Pages 294-299
Journal: Microelectronic Engineering - Volumes 78â79, March 2005, Pages 294-299
نویسندگان
J.T. Sheu, C.C. Chen, P.C. Huang, M.L. Hsu,