کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9670594 1450404 2005 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructures
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructures
چکیده انگلیسی
We present evidence that during focused electron beam induced deposition of 3D micro- and nanostructures, different growth rates are obtained when scanning the beam towards different directions, as well as on different sides of a growing structure. The effects of electron scattering are taken into account and shown to account only partially for this observation. We propose an interpretation in terms of gas dynamics around the deposits. Our observation and description of this effect could serve the future design of complex shapes.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volumes 78–79, March 2005, Pages 307-313
نویسندگان
, , ,