Design of low Tg thermosets for short cycle time nanoimprint lithography

Allyl prepolymers reported here are modified with the aim of obtaining high quality imprints at decreased imprint temperature and reduced cycle time of the imprint process. Free-radical initiators are applied to increase the polymerization rate and to let the polymerization start at lower temperatures. Adding plasticizers results in a decrease in Tg. Most favourable systems are selected out of a variety of various mixtures for imprint tests.