کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9803453 | 1516467 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Hydriding characteristics of FeTi/Pd films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The hydrogen storage properties of thin films of FeTi evaporated on Si substrates and covered with 20 nm Pd were studied. The films serve as a model system for powdered FeTi, with grains that are (partly) covered with Pd. This material could serve as a practical hydrogen storage material. The 20 nm Pd layer prevents the oxidation of the FeTi layer during air exposure up to temperatures of 200 °C and during H charging and discharging in impure hydrogen. The FeTi is a mixture of amorphous and nano-crystalline material. Two FeTi compositions (43 at.% Fe, i.e. Ti-rich, and 56 at.% Fe, i.e. Fe-rich) were studied. The H charging and discharging characteristics as a function of temperature and pressure are determined from a differential pressure measurement for Fe and Ti-rich material before and after annealing. After discharging in vacuum at a temperature of 150 °C a H residue of H/M â¼Â 0.12 is observed. The recoverable charging capacity of FeTi (also after many cycles) is 0.9 ÎH/M (H atoms per metal atom) for RT charging at 2700 mbar and vacuum discharging at 150 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 400, Issues 1â2, 1 September 2005, Pages 188-193
Journal: Journal of Alloys and Compounds - Volume 400, Issues 1â2, 1 September 2005, Pages 188-193
نویسندگان
A.M. Vredenberg, E.M.B. Heller, D.O. Boerma,