کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809861 | 1517717 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structure and properties of Ti-Si-N films prepared by ICP assisted magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Structure and properties of Ti-Si-N films prepared by ICP assisted magnetron sputtering Structure and properties of Ti-Si-N films prepared by ICP assisted magnetron sputtering](/preview/png/9809861.png)
چکیده انگلیسی
Inductively coupled plasmas (ICPs) were generated to assist magnetron sputtering. By bombarding the growing film with a high-density (â¼2.0 mA/cm2) low-energy (â¼22 eV) ion flux, Ti-Si-N films containing 0-12 at.% Si were deposited on Si(100) substrates at low deposition temperature (<150 °C). The residual compressive stresses of these films were measured to be lower than 1.5 GPa. Film hardness was significantly enhanced by the addition of a small amount of Si and attained a maximum value of 48 GPa at approximately 5.8 at.% Si. From X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) results, the superhard Ti-Si-N films were characterized as having a nanocomposite structure, consisting of nanocolumns of TiN crystallites with amorphous Si3N4 inside the column boundaries. The hardest Ti-Si-N film exhibited a pronounced TiN(200) texture. No refinement of crystallite size by the addition of Si was observed in the present series of Ti-Si-N films. Thus, the hardness enhancement was attributed to nanocomposite effect.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 193, Issues 1â3, 1 April 2005, Pages 345-349
Journal: Surface and Coatings Technology - Volume 193, Issues 1â3, 1 April 2005, Pages 345-349
نویسندگان
Z.G. Li, M. Mori, S. Miyake, M. Kumagai, H. Saito, Y. Muramatsu,