کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9829362 1524489 2005 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Properties of Na0.5Bi0.5TiO3 ferroelectric films prepared by chemical solution decomposition
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Properties of Na0.5Bi0.5TiO3 ferroelectric films prepared by chemical solution decomposition
چکیده انگلیسی
Na0.5Bi0.5TiO3 thin films have been grown on p-type Si(1 1 1) and Pt/Ti/SiO2/Si substrates by a method of chemical solution decomposition. The structure and microscopy were studied by X-ray diffraction and atomic force microscopy, respectively. The electrical measurements were conducted on metal-ferroelectric-semiconductor or metal-ferroelectric-metal capacitors. The films show low leakage current. They also exhibit good ferroelectric and dielectric properties.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 284, Issues 1–2, 15 October 2005, Pages 136-141
نویسندگان
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