کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9830167 1524504 2005 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Numerical study of the development of cellular structure during the Czochralski growth of GeSi bulk crystals
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Numerical study of the development of cellular structure during the Czochralski growth of GeSi bulk crystals
چکیده انگلیسی
Particularities of pattern formation during direction solidification of an alloy were studied for the case of small constitutional undercooling. The phase-field model of Kim et al. was applied to compute the evolution of the interface numerically. The influence of pulling velocity and temperature gradient on the growth of the cellular structure was studied. We found a strong dependency of the wave length of the cellular structure on the temperature gradient in the regime of the Czochralski growth experiment (about 3000 K/m).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 275, Issues 1–2, 15 February 2005, Pages e67-e71
نویسندگان
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