
3D Auger quantitative depth profiling of individual nanoscaled III-V heterostructures
Keywords: 81.05.Ea; 81.07.St; 68.65.Fg; 68.37.Xy; MOSFETs; metal oxide semiconductor field effect transistors; QWFETs; quantum well field effect transistors; QW; quantum well; RSFs; relative sensitivity factors; AES; Auger electron spectroscopy; SIMS; secondary ion