Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge
Keywords: رسوب پلاسما; Dielectric barrier discharge; Fluorocarbon films; Plasma deposition
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Thin plasma-polymerized layers of hexamethyldisiloxane for humidity sensor development
Keywords: رسوب پلاسما; Organosilicon; Thin films; Plasma deposition; Humidity; Sensor; Fourier transform infrared spectroscopy
Strong relation between corrosion resistance and nanostructure of compound layer of treated 316 austenitic stainless steel
Keywords: رسوب پلاسما; Nanostructures; Plasma deposition; Electron microscopy; Crystal structure; Microstructure
Metal direct prototyping by using hybrid plasma deposition and milling
Keywords: رسوب پلاسما; Plasma deposition; Metal direct prototyping; HPDM; Surface finishing
Plasma deposition of tetraethoxysilane on polycarbonate membrane for pervaporation of tetrafluoropropanol aqueous solution
Keywords: رسوب پلاسما; Plasma deposition; Tetraethoxysilane (TEOS); Pervaporation; Tetrafluoropropanol (TFP); Positron annihilation spectroscopy (PAS)
Carrier collection characteristics of microcrystalline silicon-germanium p-i-n junction solar cells
Keywords: رسوب پلاسما; 52.77.Dq; 61.43.Dq; 73.61.Cw; 73.50.Pz; Alloys; Germanium; Silicon; Plasma deposition;
In situ surface oxide reduction with pulsed arc discharge for maximum adhesion of diamond-like carbon coatings
Keywords: رسوب پلاسما; Plasma deposition; Filtered pulsed arc discharge; Diamond-like carbon
Properties of thin film silicon, prepared at high growth rate in a wide range of thicknesses
Keywords: رسوب پلاسما; 68.55.Ac; 68.37.Ps; 78.66.Jg; 73.63.BdConductivity; Plasma deposition
Deposition of microcrystalline silicon films at ultrafast rate by using a new microwave induced plasma source
Keywords: رسوب پلاسما; 52.50.Dg; 84.40.−x; 81.15.Gh; 81.05.CySilicon; Nanocrystals; Raman scattering; Chemical vapor deposition; Plasma deposition; SEM S100; Scanning electron microscopy
High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method
Keywords: رسوب پلاسما; 73.61.Jc; 68.37.Lp; 61.46.+w; 78.30.Ly; 81.15.GhGermanium; Silicon; Nanocrystals; Raman scattering; Conductivity; Chemical vapor deposition; Plasma deposition; TEM/STEM; Microcrystallinity; Powders; Nano-clusters; Nano-composites; Nanoparticles; Photoindu
Influence of boron doping on roughness microcrystalline silicon
Keywords: رسوب پلاسما; 05.45.Df; 61.72.Tt; 68.37.Ps; 68.55.−a; 81.15.GhCrystal growth; Nucleation; Plasma deposition; Atomic force and scanning tunneling microscopy
Photocarrier diffusion lengths of high-growth-rate microcrystalline silicon
Keywords: رسوب پلاسما; 05.45.Df; 68.37.Ps; 68.55.−a; 73.50.−h; 73.63.−b; 73.50.GrCrystal growth; Nanocrystals; Plasma deposition; Atomic force and scanning tunneling microscopy; Photoconductivity
Effects of pressure on pulsed laser deposition of HgCdTe films
Keywords: رسوب پلاسما; Thin films; Plasma deposition; Crystal growth; Crystal structure
Correlation between micro-roughness, surface chemistry, and performance of crystalline Si/amorphous Si:H:Cl hetero-junction solar cells
Keywords: رسوب پلاسما; 68.35.Ct; 68.55.−ag; 72.40.+w; 73.40.−cAmorphous semiconductors; Silicon; Solar cells; Devices; Heterojunctions; Photovoltaics; Diffraction and scattering measurements; X-ray diffraction; Films and coatings; Chemical vapor deposition; Plasma deposition; M
Thermal stability of light-induced defects in hydrogenated amorphous silicon: Effect on defect creation kinetics and role of network microstructure
Keywords: رسوب پلاسما; 61.43.Dq; 71.23.Cq; 76.30.âv; Amorphous semiconductors; Silicon; Chemical vapor deposition; Plasma deposition; Photoinduced effects; Infrared properties; Electron spin resonance; Defects;
Advanced optical characterization of disordered semiconductors by Fourier transform photocurrent spectroscopy
Keywords: رسوب پلاسما; 73.20.At; 78.20.âe; 78.20.Bh; 78.20.Ci; 78.90.+t; Silicon; Solar cells; Photovoltaics; Band structure; Plasma deposition; Defects; Monte Carlo simulations; Absorption; Optical spectroscopy; FTIR measurements; Photoconductivity; Structure;
Deposition of phosphorus doped a-Si:H and μc-Si:H using a novel linear RF source
Keywords: رسوب پلاسما; 68.60.−p; 73.50.Pz; 78.30.−j; 81.15.GhSilicon; Chemical vapor deposition; Plasma deposition; Microcrystallinity; Absorption; Reflectivity; FTIR measurements
Properties of n-type hydrogenated nanocrystalline cubic silicon carbide films deposited by VHF-PECVD at a low substrate temperature
Keywords: رسوب پلاسما; 61.46.Hk; 73.61.Jc; 81.15.Gh; 84.60.JtHeterojunctions; Photovoltaics; Conductivity; Plasma deposition; Nanocrystals
Normal and anti Meyer–Neldel rule in conductivity of highly crystallized undoped microcrystalline silicon films
Keywords: رسوب پلاسما; 73.50.−h; 73.61.Jc; 68.55.Jk; 61.72.Mm; 71.23.−kAmorphous semiconductors; Solar cells; Thin film transistors; Electrical and electronic properties; Conductivity; Films and coatings; Chemical vapor deposition; Ellipsometry; Plasma deposition; Microstructur
Advanced methods for titanium (IV) oxide thin functional coatings
Keywords: رسوب پلاسما; Plasma deposition; Sol–gel; Thin layers; Photoactivity; Self-assembly
Enhancement of the porous silicon photoluminescence by surface modification using a hydrocarbon layer
Keywords: رسوب پلاسما; 78.55.Mb; 78.60.-b; 78.67.Bf; 81.40.Cd; 82.80.GkPorous silicon; hydrocarbon layer; Photoluminescence; Fourier-transformed infrared spectroscopy; plasma deposition
Characterization of sp3 carbon produced by plasma deposition on gamma-TiAl alloys
Keywords: رسوب پلاسما; 85.65.Lp; Plasma deposition; Gamma-TiAl alloys; sp3 carbon;
Multilayer antireflective and protective coatings comprising amorphous diamond and amorphous hydrogenated germanium carbide for ZnS optical elements
Keywords: رسوب پلاسما; Optical coatings; Amorphous materials; Plasma deposition; Optical properties; Hardness
Ultraviolet luminescence of Gd-doped a-SiXCYOZ:H films fabricated by plasma chemical vapor deposition
Keywords: رسوب پلاسما; Plasma deposition; Photoluminescence; XPS spectroscopy; Thin amorphous films; Gadolinium; Hydrogenated silicon oxycarbide
Structural and dielectric properties of conjugated polynitrile thin films deposited by plasma polymerization
Keywords: رسوب پلاسما; 4-biphenylcarbonitrile; Plasma polymerization; Low dielectric properties; Plasma deposition
PECVD a-Sic:H Young’s modulus obtained by MEMS resonant frequency
Keywords: رسوب پلاسما; 85.85.+j; 62.20.De; 68.35.BjMEMs; Thermally stimulated; Plasma deposition; Silicon carbide
Fractional composition of large crystallite grains: A unique microstructural parameter to explain conduction behavior in single phase undoped microcrystalline silicon
Keywords: رسوب پلاسما; 73.50.âh; 73.61.Jc; 68.55.Jk; 61.72.Mm; Amorphous semiconductors; Silicon; Solar cells; Thin film transistors; Devices; Photovoltaics; Electrical and electronic properties; Conductivity; Films and coatings; Chemical vapor deposition; Ellipsometry; Plasm
Production of CN(B2Σ+) state from dissociative excitation reaction of BrCN with microwave discharge flow of Ar
Keywords: رسوب پلاسما; 52.70.Kz; 81.05.Uw; 81.15.Gh; 82.33.XjChemical vapor deposition; Plasma deposition; Optical spectroscopy
Microstructure and properties of nano-Al2O3 particle reinforced Ni–Cr–Mo–Cu composite alloying layer
Keywords: رسوب پلاسما; Thin films; Composite materials; Plasma deposition; Corrosion
Determination of the crystallization ratio in a series of Fe-containing vitroceramic products by means of XAFS spectroscopies
Keywords: رسوب پلاسما; 61.10.Ht; 87.64.Fb; 78.55.Qr; 78.70.DmIII–V semiconductors; Silicon; Crystal growth; Heterojunctions; Conductivity; Chemical vapor deposition; Laser deposition; Plasma deposition; Sputtering; Vapor phase deposition; Oxynitride glasses; Nuclear and chemica
Plasma deposition and characterization of silicon oxide-containing diamond-like carbon films obtained from CH4:SiH4:O2 gas mixtures
Keywords: رسوب پلاسما; DLC; DLC–SiOx; Nanocomposites; Oxygen incorporation in DLC; Plasma deposition
Plasma-deposited copper phthalocyanine: A single gas-sensing material with multiple responses
Keywords: رسوب پلاسما; Plasma deposition; Electrical gas sensing; Optical gas sensing
Effect of UV anneal on plasma CVD low-k film
Keywords: رسوب پلاسما; 81.05.Rm; 81.15.Gh; 82.50.Hp; 82.80.NjAmorphous metals, metallic glasses; Dielectric properties, relaxation, electric modulus; Plasma deposition; Indentation, microindentation; FTIR measurements; Silicates
Treatise on the Resolution of the diamond problem after 200 years
Keywords: رسوب پلاسما; Diamond; High pressure; Plasma deposition; Catalytic properties; Magnetic properties
Deposition of polymeric perfluored thin films in proton ionic membranes by plasma processes
Keywords: رسوب پلاسما; 52.77.Dq; 81.05.Lg; 81.65.âb; Surface treatments; Plasma deposition; Proton ionic membranes;
Synthesis of carbon nanotubes within Pt nanoparticles-decorated AAO template
Keywords: رسوب پلاسما; Nanomaterials; X-ray techniques; Plasma deposition; Pt nanoparticles
Fabrication of highly (1000) oriented textured zinc oxide films by metal cathodic arc and oxygen dual plasma deposition and their optical properties
Keywords: رسوب پلاسما; 71.55.Gs; 68.55.Jk; 78.20.Ci; Zinc oxide; Cathodic arc; Plasma deposition; Optical properties;
Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation
Keywords: رسوب پلاسما; 52.65.Yy; 81.65.Cf; 52.77.DqChemical vapor deposition; Plasma deposition; Modeling and simulation
Thin cobalt oxide films for catalysis deposited by plasma-enhanced metal–organic chemical vapor deposition
Keywords: رسوب پلاسما; Cobalt oxide; Plasma deposition; Catalysis; Nanostructures
Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system
Keywords: رسوب پلاسما; 81.15.−z; 68.55.−a; 68.60.Bs; 81.05.−tFilms and coatings; Chemical vapor deposition; Plasma deposition; Vapor phase deposition; Hardness; Indentation; Microindentation; Microstructure; FTIR measurements; XPS
Deposition of hard amorphous hydrogenated carbon films by radiofrequency parallel-plate hollow-cathode plasmas
Keywords: رسوب پلاسما; Hollow-cathode; Plasma deposition; Amorphous hydrogenated carbon; Mechanical properties
Optical response of plasma-deposited zinc phthalocyanine films to volatile organic compounds
Keywords: رسوب پلاسما; Zinc phthalocyanine; Plasma deposition; Optical sensing; VOCs detection
Mechanical properties and oxidation behaviour of plasma sprayed functionally graded zirconia–alumina thermal barrier coatings
Keywords: رسوب پلاسما; Plasma deposition; Zirconia–alumina composite coatings; Hardness; Porosity; Image analysis; Oxidation
Influence of annealing on the physical properties of filtered vacuum arc deposited tin oxide thin films
Keywords: رسوب پلاسما; 42.70.a; 78.20.Ci; 81.05.Uw; 81.15.EfII–VI Semiconductors; Ellipsometry; Plasma deposition; Atomic force and scanning tunneling microscopy; Optical properties; Absorption; Tin oxide; X-ray diffraction
First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition
Keywords: رسوب پلاسما; Nucleation; Thin film growth; Plasma deposition; XPS; TEM; Background analysis; Monte Carlo simulation; SiO2;
Spectroscopic and electrical detection of intermediate phases and chemical bonding self-organizations in (i) dielectric films for semiconductor devices, and (ii) chalcogenide alloys for optical memory devices
Keywords: رسوب پلاسما; 61.10.Ht; 61.46.Bc; 78.66.Jg; 81.05.GcAmorphous semiconductors; Silicon; Thin film transistors; Plasma deposition; Sputtering; Defects; Short-range order; Stress relaxation
New insights in microcrystalline silicon deposition with expanding thermal plasma chemical vapor deposition
Keywords: رسوب پلاسما; 52.77.Dq; 61.43.Dq; 81.15.Aa; 81.15.GhSilicon; Microcrystallinity; Plasma deposition; Raman spectroscopy; FTIR measurements; Growth mechanism; Solar cells
High-rate deposition of nanocrystalline silicon using the expanding thermal plasma technique
Keywords: رسوب پلاسما; 52.75.Rx; 68.60.−p; 81.15.−zSilicon; Plasma deposition
The application of very high frequency inductively coupled plasma to high-rate growth of microcrystalline silicon films
Keywords: رسوب پلاسما; 52.80.Yr; 52.40.−w; 73; 78.20.CiSilicon; Crystal growth; Nucleation; Nanocrystals; Plasma deposition; Microcrystallinity; Optical spectroscopy; Raman spectroscopy
Micro-cavity organic light emitting diodes for biochip applications
Keywords: رسوب پلاسما; Chemical vapor deposition; Plasma deposition; Vapor phase deposition; Optical spectroscopy; Electroluminescence; Luminescence; Polymers and organics; Indium tin oxide and other transparent conductors