
On the influence of the surface roughness onto the ultrathin SiO2/Si structure properties
Keywords: میکروسکوپ تونل زنی اسکن (STM); 68.35.bg; 68.35.Ct; 68.37.Ef; 68.37.Ps; Semiconductor; Thin film; Surface roughness; Fractal methods; Atomic force microscopy (AFM); Scanning tunneling microscopy (STM);