
Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers
Keywords: اسپری کردن; Alumina; Sputtering; Radio-frequency power; Silicon; Surface passivation; Quasi-steady-state photoconductance; Lifetime;