Passivation property of ultrathin SiOx:H / a-Si:H stack layers for solar cell applications
Keywords: passivation سطح; Surface passivation; Silicon heterojunction (SHJ); Tunnel oxide passivated contact (TOPCon); Hydrogenated silicon oxide (SiOx:H); Hydrogenated amorphous silicon (a-Si:H); Atomic layer deposition (ALD); Fourier transform infra-red (FTIR);